Photoelectrochemical Study of Thin Anatase TiO2 Films Prepared by Metallorganic Chemical Vapor Deposition
نویسندگان
چکیده
منابع مشابه
Formation of TiO2 Thin Films using NH3 as Catalyst by Metalorganic Chemical Vapor Deposition
We have studied metalorganic chemical vapor deposition of TiO2 thin films using titanium tetra-isopropoxide [TTIP, Ti(O–C3H7)4] and NH3 as a catalyst at deposition temperatures ranging from 250 to 365◦C. At deposition temperatures above 330◦C, pyrolytic self-decomposition of TTIP is dominant regardless of the use of NH3, and the activation energy for TiO2 film formation is 152 kJ/mol. At deposi...
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ژورنال
عنوان ژورنال: Journal of The Electrochemical Society
سال: 1997
ISSN: 0013-4651,1945-7111
DOI: 10.1149/1.1837590